Ferroelectrics
A ferroelectric material in general is defined by the existence of a permanent spontaneous polarization Ps at temperatures below the Curie temperature whereby the direction of Ps can be reversed by the application of an electric field exceeding the coercive field Ec. The value of Ec is defined using the hysteresis loop which can be recorded during a poling cycle ramping up and down the applied electric field. Theoretical calculations of the value of Ec failed up to now. A ferroelectric material is by nature always piezoelectric and also pyroelectric.
Ferroelectric domains
A
ferroelectric domain is an area of oriented spontaneous polarization.
Local poling, i.e. the controlled formation of domains, makes of
ferroelectrics very important materials for applications such as data
storage devices or optical frequency converters. The controlled
formation of domains is therefore of major importance. In general, local
poling is performed by locally applying an electric field surpassing Ec
using structured electrodes, named electric field poling (EFP). We
investigated a new technique for controlled domain formation thereby
defining the domain pattern by UV-laser light irradiation. Another
technique under investigation for local poling consists in the
application of an electric field with the help of a scanning probe
microscope tip, named tip-based domain formation.
Domain formation by UV-laser irradiation
In close collaboration with Sakellaris Mailis from the ORC in Southampton, GB.
This
method for domain revesal uses a tightly focused, strongly absorbed
UV-laser beam to define the area of domain reversal. Scanning the laser
beam across the LiNbO3 surface results either in poling
inhibition (+z) or in direct writing (-z and the non-polar x- and
y-faces). This method for domain reversal allow for the formation of
domain patterns irrespective of the crystallographic preferences (a
domain growth along the y-axis) and further more avoids the cumbersome
and expensive clean-room processing required for EFP.
The domain patterns obtained by UV-laser irradiation are seen in the opposed figure, recorded with piezoresponse force microscopy. (a) shows a PPLN structure (horizontal stripes) where three lines (perpendicular stripes) have been written across by scanning the UV-laser beam. The black area represents a -z face, the bright one a +z face. The crystal underwent no further processing. Obviously, direct domain inversion took place in on the -z face whereas the +z face remained unchanged. In (b) an example of poling inhibition is shown. Prior to large area EFP, the crystals +z face was irradiated with UV laser spots. In the EFP poling step, part of the crystal was poled (seen as dark area) - the spots however resisted poing. Finally (c) shows an example of direct writing on a x face of LiNbO3 surface. As it can be seen from the thermoinduced cracks, only half or the width of the laser-beam was domain inverted. |
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In close collaboration with Richard Osgood from Columbia University, USA.
Driven by the progess of smart-cut technology which allows to fabricate lithium niobate thin film single crystals we investigated the possibility of domain formation in He-implanted crystals. In view of their further applicability for photonic crystal devices, we focused on large-area nano-domain patterning.
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PFM-image of a cross-section of a He-implanted sample. (a) shows the schematics of the sample under investigation. In (b) the piezoresponse os displayed, and in (c) an according scanline. due to the sample geometry we recorded the lateral PFM signal, depicting the direction and magnitude of the d33 piezoelectric tensor element. In the non-affected area, far from the glue, the maximum signal is obtained. The glue-layer is not piezoelectric, and shows therefor no PFM signal at all, at the He-implanted layer, the piezoresponse is reduced to ~15% of its original value. |
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Large
area domain patterning was performed by automatized tip-based domain
formation using a computer controlled scripting. An example with 20 x 20
domains, every individual domain being << 1µm in diameter, is
shown in the figure opposed. A self-regulating domain size mechanism,
beased on Coulomb repulsion, assures the identical size of the
individual domains within the pattern. The voltage applied to te tip,
together with the inter-domain spacing , defines the size of the
individual domains. Using this technique we were able to fabricate large
patterns with 16.000 domains, all of equal size. The depth of the
domains was found to be of teh order of few microns. |
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The opposed figure shows a poling map obtained on a nearly stoichiometric magnesium doped LiNbO3 crystal. All domains were geneated with a fixed pulse amplitude of 100 V. We varied the pulse duration and the waiting time. The latter is given by the durating between the ending of the pulse before moving towards a new position. The domains in general exhibit a central hole which forms instantaneously after the pulse. The stability of the domains can be estimated by their ease of transforming into c-domains. For instance domains written with long pulses (right side) are more stable since they could relax during the pulse. |
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The figure shows the size of domains written with pulses of durations between 0.02 s and 1000 s. Obviously, the size is constant for short pulse durations (up to ~ 1 s) and increases logaritmically only for larged durations. The size of the domain that formes instantanesouly, the starter domain Ds, allows now for determining Ec. We therefore assumed that within the area of Ds, the electric field emerging from the tip at least as large as Ec. Together with the electric field distribution underneath the tip, a value for Ec can be determined. | ![]() |
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Fabrication of photonic microstructures
In close collaboration with Sakellaris Mailis from the ORC in Southampton, GB.
Microstructures
of nonlinear optical crystalline material are in general fabricated by a
cumbersome cutting and polishing procedure. Highly desirable for
applications such as whispering mode galleryl resonatores the surface
quality of sich components, however, is of major importance. A very
different approach for the fabrication of topographical microstructures
takes advantage of the domain selective etching. This allows to transfer
a domain pattern into a topographical structure. In order to smoothen
the surfaces which became rough during the etching process, the samples
are submitted to a thermal annealing procedure. This technique yields
ultra-smooth microstructures as it can be seen in the figure below.